Dia.3"X3mm 2N5 Titanium Sputtering Target 99.995% Ti Metal Material

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Dia.3"X3mm 2N5 Titanium Sputtering Target 99.995% Ti Metal Material
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Keywords: High Purity Metal Target Titanium
Application: Liquid Crystal Display, Laser Memory,
Grade: Gr1
Ti Content (%): 99.6%, 99.99%, 99, 99.95%-99.999%, 95%
Shape: Round, Customs Made, Round & Rectangle, Tube/ Plate, As Request
Surface: Polished, Cleaning, CNC Lathe Surface, Pickled, Bright
Product Name: Titanium Disc,titanium Bars,Chromium Aluminum Alloy,Ti Flat Sputtering Target,titanium Sputtering Target
Standard: ASTM Standard B265 Grade1
Name: High Purity GR1 Sputtering Titanium Target
Type: Electrochemistry Equipment,Round Target,high Purity CrAl,metal Titanium
Keyword: Titanium Bars China,titanium Sputtering Target,pure Titanium Target,MMO Coating Titanium Anode
High Light:

2N5 Titanium Sputtering Target


3"X3mm Titanium Sputtering Target


99.995% Metal Sputtering Target

Basic Infomation
Place of Origin: China
Certification: ISO9001:2015 certification
Model Number: CDX--TB-2021020
Payment & Shipping Terms
Packaging Details: plywood case
Delivery Time: 5-35 working days
Supply Ability: 50000KG/month
Product Description

TiC Titanium Carbide Ceramic Target Dia.3"X3mm 2N5 Sputtering Target
Square Pure Titanium Sputtering Target High Purity 99.995% Circular Ti Titanium Sputtering Target
Titanium sputtering target
 PVD coating Grade 1 Titanium Arc Target Ti Target titanium sputtering target​

TiC Titanium Carbide Ceramic Target Dia.3"x3mm 2N5 Sputtering Target
high purity GR1 sputtering titanium target

★ Material
TitaniumGr. 1
Key wordsTitanium target
Titanium sputtering target , target pure titanium target, MMO Coating Titanium Anode
◆ liquid crystal display, laser memory,
◆ Electronic controller sputtering thin film material,
◆ Semiconductor integrated circuits,
◆ Solar photovoltaic, Recording medium,
◆Flat display, Workpiece surface coating etc..


SurfacePolished, Cleaning, CNC lathe surface, Pickled, bright
Dimensionsaccording customer’s request.
Ti content(%)99.96% 99.98% 99.99%
Colortitanium original color
Services: CNC , machining, turning, milling, stamping, casting, drilling, grinding, threading etc.

Dia.3"X3mm 2N5 Titanium Sputtering Target 99.995% Ti Metal Material 0Dia.3"X3mm 2N5 Titanium Sputtering Target 99.995% Ti Metal Material 1Dia.3"X3mm 2N5 Titanium Sputtering Target 99.995% Ti Metal Material 2

Terms of tradeEXW, FOB, CIF
Terms of paymentT/T, L/C
Packingplastic paper inside, plywood case outside.
Quality controlUltrasonic testing & material test report
Delivery time7-30 days
MOQSmall order quantity is acceptable.
Business TypeManufacturer, Foreign Trading

High purity and high density sputtering targets include:
Sputtering target (purity: 99.9% - 99.999%)
Titanium target titanium sputtering target is used for liquid crystal display, laser memory,
electronic controller sputtering thin film materials, semiconductor integrated circuits,
solar photovoltaic, recording media, plane display and workpiece surface coating
Q: Why choose us?
A1: We have 14 years experience for titanium products making.
A2: sample order is acceptable.
A3: lower price, good quality and short delivery time.
A4:The quotation can be make within 24 hours.
A5: ISO9001:2015 certification
A6: Give us drawing, make your drawings and ideas become a reality!
A7: Provide third-party quality inspection reports.

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Get in touch with us
Contact Person : Grace He
Tel : 86018220766064
Fax : 86-917-3376-589
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