TiB2 Diboride Titanium Sputtering Target CNC Milling For Electrochemistry Equipment

Samples available
MOQ
Negotiable
Price
TiB2 Diboride Titanium Sputtering Target CNC Milling For Electrochemistry Equipment
Features Gallery Product Description Request A Quote
Features
Specifications
Keywords: High Purity Metal Target Titanium
Application: Liquid Crystal Display, Laser Memory,
Grade: Gr1
Ti Content (%): 99.6%, 99.99%, 99, 99.95%-99.999%, 95%
Shape: Round, Customs Made, Round & Rectangle, Tube/ Plate, As Request
Surface: Polished, Cleaning, CNC Lathe Surface, Pickled, Bright
Product Name: Titanium Disc,titanium Bars,Chromium Aluminum Alloy,Ti Flat Sputtering Target,titanium Sputtering Target
Standard: ASTM Standard B265 Grade1
Name: High Purity GR1 Sputtering Titanium Target
Type: Electrochemistry Equipment,Round Target,high Purity CrAl,metal Titanium
Keyword: Titanium Bars China,titanium Sputtering Target,pure Titanium Target,MMO Coating Titanium Anode
NAME: High Purity TiB2 Titanium Diboride Sputtering Target
High Light:

TiB2 Titanium Sputtering Target

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Diboride Titanium Sputtering Target

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Electrochemistry Equipment CNC Milling Titanium

Basic Infomation
Place of Origin: China
Brand Name: QUALITY METALS
Certification: ISO9001:2015 certification
Model Number: CDX--TB-2021022
Payment & Shipping Terms
Packaging Details: plywood case
Delivery Time: 5-35 working days
Supply Ability: 50000KG/month
Product Description

High Purity TiB2 Titanium Diboride Sputtering Target

Square Pure Titanium Sputtering Target High Purity 99.995% Circular Ti Titanium Sputtering Target
Titanium sputtering target
 PVD coating Grade 1 Titanium Arc Target Ti Target titanium sputtering target​

99.9% Tiox Titanium Oxide Rotary Target sputtering target Pvd vacuum coating Titanium Oxide TIOX Sputtering Target
 high purity TiB2 titanium diboride sputtering target

★ Material
Titanium Gr. 1
Key words Titanium sputtering target
Titanium sputtering target , target pure titanium target, MMO Coating Titanium Anode
Application:
◆ liquid crystal display, laser memory,
◆ Electronic controller sputtering thin film material,
◆ Semiconductor integrated circuits,
◆ Solar photovoltaic, Recording medium,
◆Flat display, Workpiece surface coating etc..

 
 

Tolerance +/-0.01mm
Surface Polished, Cleaning, CNC lathe surface, Pickled, bright
Dimensions according customer’s request.
Ti content(%) 99.96% 99.98% 99.99%
Density 4.51g/cm3
Color titanium original color
Services: CNC , machining, turning, milling, stamping, casting, drilling, grinding, threading etc.

 

100% quality inspection

 
TiB2 Diboride Titanium Sputtering Target CNC Milling For Electrochemistry Equipment 0

Clean the surface to avoid defects such as oil stains, scratches, etc.

TiB2 Diboride Titanium Sputtering Target CNC Milling For Electrochemistry Equipment 1

TiB2 Diboride Titanium Sputtering Target CNC Milling For Electrochemistry Equipment 2

 

Packing
TiB2 Diboride Titanium Sputtering Target CNC Milling For Electrochemistry Equipment 3

Terms of trade EXW, FOB, CIF
Terms of payment T/T, L/C
Packing plastic paper inside, plywood case outside.
Quality control Ultrasonic testing & material test report
Delivery time 7-30 days
MOQ Small order quantity is acceptable.
Business Type Manufacturer, Foreign Trading

 
"Sputtering targets are mainly used in electronic and information industries, such as integrated circuit, information storage, liquid crystal display, laser memory, electronic controller, etc.; they can also be used in the field of glass coating; they can also be used in industries such as wear-resistant materials, high temperature corrosion resistance, high-grade decorative products, etc.


The requirements of sputtering target are higher than those of traditional material industry, such as size, flatness, purity, impurity content, density, N / O / C / s, grain size and defect control; higher or special requirements include: surface roughness, resistance value, grain size uniformity, composition and structure uniformity, foreign matter (oxide) Content and size, permeability, ultra-high density and ultra-fine grain, etc. magnetron sputtering coating is a new physical vapor coating method, which uses an electron gun system to emit and focus electrons on the plated material, so that the sputtered atoms follow the principle of momentum conversion and fly away from the material to the substrate with high kinetic energy to form a film. This plated material is called sputtering target.
Q: Why choose us?
A1: We have 14 years experience for titanium products making.
A2: sample order is acceptable.
A3: lower price, good quality and short delivery time.
A4:The quotation can be make within 24 hours.
A5: ISO9001:2015 certification
A6: Give us drawing, make your drawings and ideas become a reality!
A7: Provide third-party quality inspection reports.

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Get in touch with us
Contact Person : Grace He
Tel : 86018220766064
Fax : 86-917-3376-589
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