High Purity Titanium Metal Sputtering Target For Thin Film Coating, Tantalum / Rhodium /Ruthenium Sputtering Target
Square Pure Titanium Sputtering Target High Purity 99.995% Circular Ti Titanium Sputtering Target
Titanium sputtering target
PVD coating Grade 1 Titanium Arc Target Ti Target titanium sputtering target
99.9% Tiox Titanium Oxide Rotary Target sputtering target Pvd vacuum coating Titanium Oxide TIOX Sputtering Targethigh purity titanium metal Sputtering Target for thin film coating, tantalum / Rhodium /Ruthenium Sputtering Target
| ★ Material | |
| Titanium | tantalum rhodium |
| Key words | Titanium sputtering target |
| Titanium sputtering target , target pure titanium target, MMO Coating Titanium Anode | |
| Application: | |
| ◆ liquid crystal display, laser memory, | |
| ◆ Electronic controller sputtering thin film material, | |
| ◆ Semiconductor integrated circuits, | |
| ◆ Solar photovoltaic, Recording medium, | |
| ◆Flat display, Workpiece surface coating etc.. | |
| Tolerance | +/-0.01mm |
| Surface | Polished, Cleaning, CNC lathe surface, Pickled, bright |
| Dimensions | according customer’s request. |
| Ti content(%) | 99.96% 99.98% 99.99% |
| Density | 4.51g/cm3 |
| Color | titanium original color |
| Services: CNC , machining, turning, milling, stamping, casting, drilling, grinding, threading etc. | |
| Terms of trade | EXW, FOB, CIF |
| Terms of payment | T/T, L/C |
| Packing | plastic paper inside, plywood case outside. |
| Quality control | Ultrasonic testing & material test report |
| Delivery time | 7-30 days |
| MOQ | Small order quantity is acceptable. |
| Business Type | Manufacturer, Foreign Trading |
"Sputtering targets are mainly used in electronic and information industries, such as integrated circuit, information storage, liquid crystal display, laser memory, electronic controller, etc.; they can also be used in the field of glass coating; they can also be used in industries such as wear-resistant materials, high temperature corrosion resistance, high-grade decorative products, etc.
The requirements of sputtering target are higher than those of traditional material industry, such as size, flatness, purity, impurity content, density, N / O / C / s, grain size and defect control; higher or special requirements include: surface roughness, resistance value, grain size uniformity, composition and structure uniformity, foreign matter (oxide) Content and size, permeability, ultra-high density and ultra-fine grain, etc. magnetron sputtering coating is a new physical vapor coating method, which uses an electron gun system to emit and focus electrons on the plated material, so that the sputtered atoms follow the principle of momentum conversion and fly away from the material to the substrate with high kinetic energy to form a film. This plated material is called sputtering target.
Q: Why choose us?
A1: We have 14 years experience for titanium products making.
A2: sample order is acceptable.
A3: lower price, good quality and short delivery time.
A4:The quotation can be make within 24 hours.
A5: ISO9001:2015 certification
A6: Give us drawing, make your drawings and ideas become a reality!
A7: Provide third-party quality inspection reports.
