Pure 99.99% Titanium Sputtering Target ASTM B265 Gr1 Material

Samples available
MOQ
Negotiable
Price
Pure 99.99% Titanium Sputtering Target  ASTM B265 Gr1 Material
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Features
Specifications
Keywords: Pure Ti Target Grade 1 Titanium Sputtering Target With Diameter 95mm
NAME: Titanium Sputtering Target Customized Dimension Gr 1 Target
Keyword: Titanium Bars , Titanium Sputtering Target,pure Titanium Target,MMO Coating Titanium Anode
Grade: Gr1
Ti Content (%): 99.6%, 99.99%, 99, 99.95%-99.999%, 95%
Shape: Round, Customs Made, Round & Rectangle, Tube/ Plate, As Request
Surface: Polished, Cleaning, CNC Lathe Surface, Pickled, Bright
Product Name: Titanium Disc,titanium Bars,Chromium Aluminum Alloy,Ti Flat Sputtering Target,titanium Sputtering Target
Standard: ASTM Standard B265 Grade1
Name: High Purity GR1 Sputtering Titanium Target
Type: Electrochemistry Equipment,Round Target,high Purity CrAl,metal Titanium
High Light:

Gr1 Titanium Sputtering Target

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ASTM B265 Titanium Sputtering Target

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99.99% Sputtering Target Material

Basic Infomation
Place of Origin: China
Brand Name: QUALITY METALS
Certification: ISO9001:2015 certification
Model Number: CDX--TB-2021023
Payment & Shipping Terms
Packaging Details: plywood case
Delivery Time: 5-35 working days
Supply Ability: 50000KG/month
Product Description

Titanium Sputtering Target Customized Dimension Gr1 Target

Sputtering target (purity: 99.9%-99.999%)Square Pure Titanium Sputtering Target High Purity 99.995% Circular Ti Titanium Sputtering Target

 PVD coating Grade 1 Titanium Arc Target Ti Target titanium sputtering target

titanium sputtering target Customized dimension gr 1 target

★ Material
Titanium   tantalum rhodium 
Key words Titanium sputtering target
Titanium sputtering target , target pure titanium target, MMO Coating Titanium Anode
Application:
◆ liquid crystal display, laser memory,
◆ Electronic controller sputtering thin film material,
◆ Semiconductor integrated circuits,
◆ Solar photovoltaic, Recording medium,
◆Flat display, Workpiece surface coating etc..

 
 

Tolerance +/-0.01mm
Surface Polished, Cleaning, CNC lathe surface, Pickled, bright
Dimensions according customer’s request.
Ti content(%) 99.96% 99.98% 99.99%
Density 4.51g/cm3
Color titanium original color
Services: CNC , machining, turning, milling, stamping, casting, drilling, grinding, threading etc.

 

Pure 99.99% Titanium Sputtering Target  ASTM B265 Gr1 Material 0Pure 99.99% Titanium Sputtering Target  ASTM B265 Gr1 Material 1

 

100% quality inspection

 
Pure 99.99% Titanium Sputtering Target  ASTM B265 Gr1 Material 2

Clean the surface to avoid defects such as oil stains, scratches, etc.

Pure 99.99% Titanium Sputtering Target  ASTM B265 Gr1 Material 3

Pure 99.99% Titanium Sputtering Target  ASTM B265 Gr1 Material 4

 

Packing


Pure 99.99% Titanium Sputtering Target  ASTM B265 Gr1 Material 5

Pure 99.99% Titanium Sputtering Target  ASTM B265 Gr1 Material 6

Terms of trade EXW, FOB, CIF
Terms of payment T/T, L/C
Packing plastic paper inside, plywood case outside.
Quality control Ultrasonic testing & material test report
Delivery time 7-30 days
MOQ Small order quantity is acceptable.
Business Type Manufacturer, Foreign Trading

 Sputtering targets include metals, alloys, and ceramic compounds.
Sputtering is one of the main techniques for preparing thin-film materials. It uses ions generated by an ion source to accelerate and accumulate in a vacuum to form a high-speed energy ion beam, which bombards the solid surface, and exchanges kinetic energy between the ions and the atoms on the solid surface. The atoms on the solid surface leave the solid and are deposited on the surface of the substrate. The bombarded solid is the raw material for preparing the sputtering deposition film, which is called the sputtering target. Various types of sputtered thin film materials have been widely used in semiconductor integrated circuits, solar photovoltaics, recording media, flat displays, and surface coatings of workpieces.
High-purity and high-density sputtering targets include:
Sputtering target (purity: 99.9%-99.999%)
Magnetron sputtering coating is a new physical vapor deposition method, which uses an electron gun system to emit and focus electrons on the plated material, so that the sputtered atoms follow the momentum conversion principle and fly away from the material to the substrate with high kinetic energy to form a film. This plated material is called sputtering target.


Q: Why choose us?
A1: We have 14 years experience for titanium products making.
A2: sample order is acceptable.
A3: lower price, good quality and short delivery time.
A4:The quotation can be make within 24 hours.
A5: ISO9001:2015 certification
A6: Give us drawing, make your drawings and ideas become a reality!
A7: Provide third-party quality inspection reports.

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Contact Person : Grace He
Tel : 86018220766064
Fax : 86-917-3376-589
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