Titanium Sputtering Target Target Customizable High Purity
| Tolerance | +/-0.01mm |
| Surface | Polished, Cleaning, CNC lathe surface, Pickled, bright |
| Dimensions | according customer’s request. |
| Ti content(%) | 99.96% 99.98% 99.99% |
| Density | 4.51g/cm3 |
| Color | titanium original color |
| Titanium Sputtering Target Target Customizable High Purity | |
Provide quality inspection report like this with the goods,
which shows the chemical composition and physical properties
100% quality inspection, quality assurance.
Professional titanium manufacturing experience.
Because we only make titanium, we are more professional in titanium
ISO9001:2015 certification
Friendly customer service and short delivery time.
Titanium sputtering targets are mainly used in the electronics and information industries, such as integrated circuits, information storage, liquid crystal displays, laser memory, electronic control devices, etc.; they can also be used in the field of glass coating; they can also be used in wear-resistant materials, high temperature resistance Corrosion, high-end decorative products and other industries.
Classification
According to the shape, it can be divided into titanium square target, titanium round target, titanium special-shaped target
According to the composition, it can be divided into metal target, alloy target, ceramic compound target
According to different applications, it is divided into semiconductor related ceramic targets, recording medium ceramic targets, display ceramic targets, superconducting ceramic targets and giant magnetoresistance ceramic targets, etc.
According to the application field, it is divided into microelectronic target material, magnetic recording target material, optical disc target material, precious metal target material, thin film resistance target material, conductive film target material, surface modification target material, mask layer target material, decorative layer target material, Electrode targets, package targets, other targets
