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Products: | Purity Titanium Target | Key Words: | High Purity Titanium Target Titanium Sputtering Target |
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Application: | Liquid Crystal Display | Technique: | Grinding Machine |
Application 1: | Glass Coating | Application 2: | Laser Memory |
Application 3: | Electronic Control Devices, | Surface: | Machine Brightened Surface |
Highlight: | Laser Memory Zirconium Target,Brightened Surface Tantalum Target,99.96% Ti Target |
High Purity Titanium Target Titanium Sputtering Target
We can provide round titanium target, square titanium target, rectangular titanium target,
or according to your requirements or drawings.
Tolerance | +/-0.01mm |
Surface | Polished, Cleaning, CNC lathe surface, Pickled, bright |
Dimensions | according customer’s request. |
Ti content(%) | 99.96% 99.98% 99.99% |
Density | 4.51g/cm3 |
Color | titanium original color |
Titanium Sputtering Target Target Customizable High Purity |
Provide quality inspection report like this with the goods,
which shows the chemical composition and physical properties
100% quality inspection, quality assurance.
Professional titanium manufacturing experience.
Because we only make titanium, we are more professional in titanium
ISO9001:2015 certification
Friendly customer service and short delivery time.
Titanium sputtering targets are mainly used in the electronics and information industries, such as integrated circuits, information storage, liquid crystal displays, laser memory, electronic control devices, etc.; they can also be used in the field of glass coating; they can also be used in wear-resistant materials, high temperature resistance Corrosion, high-end decorative products and other industries.
High-purity and high-density sputtering targets include:
Sputtering target (purity: 99.9%-99.999%)
Magnetron sputtering coating is a new type of physical vapor coating method. Compared with evaporation coating method, it has obvious advantages in many aspects. As a relatively mature technology that has been developed, magnetron sputtering has been applied in many fields. Titanium sputtering target
Sputtering Technology Titanium Sputtering Targets
Sputtering is one of the main technologies for the preparation of thin film materials. It uses ions generated by an ion source to accelerate and aggregate in a vacuum to form a high-speed energy ion beam, bombard the solid surface, and exchange kinetic energy between ions and solid surface atoms. The atoms on the solid surface leave the solid and are deposited on the surface of the substrate. The bombarded solid is the raw material for preparing the thin film deposited by the sputtering method, which is called the sputtering target. Various types of sputtered thin film materials have been widely used in semiconductor integrated circuits, solar photovoltaics, recording media, flat-panel displays, and workpiece surface coatings.
Contact Person: Ms. Grace
Tel: +8613911115555
Fax: 86-0755-11111111