Laser Memory Titanium Sputtering Target Brightened Surface 99.96% Ti content

10 piece
MOQ
Negotiable
Price
Laser Memory Titanium Sputtering Target Brightened Surface 99.96% Ti content
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Features
Specifications
Products: Purity Titanium Target
Key Words: High Purity Titanium Target Titanium Sputtering Target
Application: Liquid Crystal Display
Technique: Grinding Machine
Application 1: Glass Coating
Application 2: Laser Memory
Application 3: Electronic Control Devices,
Surface: Machine Brightened Surface
High Light:

Laser Memory Zirconium Target

,

Brightened Surface Tantalum Target

,

99.96% Ti Target

Basic Infomation
Place of Origin: China
Brand Name: N/M
Certification: ISO9001:2015 certification
Model Number: CDX-20220310A
Payment & Shipping Terms
Packaging Details: plywood case
Delivery Time: 5-35 working days
Supply Ability: 10000KG/month
Product Description

High Purity Titanium Target Titanium Sputtering Target

 

We can provide round titanium target, square titanium target, rectangular titanium target,

or according to your requirements or drawings.

 

Tolerance +/-0.01mm
Surface Polished, Cleaning, CNC lathe surface, Pickled, bright
Dimensions according customer’s request.
Ti content(%) 99.96% 99.98% 99.99%
Density 4.51g/cm3
Color titanium original color
Titanium Sputtering Target Target  Customizable  High Purity

 

Laser Memory Titanium Sputtering Target Brightened Surface 99.96% Ti content 0Laser Memory Titanium Sputtering Target Brightened Surface 99.96% Ti content 1

 


Provide quality inspection report like this with the goods,

which shows the chemical composition and physical properties

Laser Memory Titanium Sputtering Target Brightened Surface 99.96% Ti content 2

 

 

 

100% quality inspection, quality assurance.

Professional titanium manufacturing experience.

Because we only make titanium, we are more professional in titanium

 

ISO9001:2015 certification

 

Friendly customer service and short delivery time.

 

Titanium sputtering targets are mainly used in the electronics and information industries, such as integrated circuits, information storage, liquid crystal displays, laser memory, electronic control devices, etc.; they can also be used in the field of glass coating; they can also be used in wear-resistant materials, high temperature resistance Corrosion, high-end decorative products and other industries.

High-purity and high-density sputtering targets include:
Sputtering target (purity: 99.9%-99.999%)

Magnetron sputtering coating is a new type of physical vapor coating method. Compared with evaporation coating method, it has obvious advantages in many aspects. As a relatively mature technology that has been developed, magnetron sputtering has been applied in many fields. Titanium sputtering target
Sputtering Technology Titanium Sputtering Targets
Sputtering is one of the main technologies for the preparation of thin film materials. It uses ions generated by an ion source to accelerate and aggregate in a vacuum to form a high-speed energy ion beam, bombard the solid surface, and exchange kinetic energy between ions and solid surface atoms. The atoms on the solid surface leave the solid and are deposited on the surface of the substrate. The bombarded solid is the raw material for preparing the thin film deposited by the sputtering method, which is called the sputtering target. Various types of sputtered thin film materials have been widely used in semiconductor integrated circuits, solar photovoltaics, recording media, flat-panel displays, and workpiece surface coatings.

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Get in touch with us
Contact Person : Grace He
Tel : 86018220766064
Fax : 86-917-3376-589
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