High Purity Titanium Target Titanium Sputtering Target
We can provide round titanium target, square titanium target, rectangular titanium target,
or according to your requirements or drawings.
| Tolerance | +/-0.01mm |
| Surface | Polished, Cleaning, CNC lathe surface, Pickled, bright |
| Dimensions | according customer’s request. |
| Ti content(%) | 99.96% 99.98% 99.99% |
| Density | 4.51g/cm3 |
| Color | titanium original color |
| Titanium Sputtering Target Target Customizable High Purity | |
Provide quality inspection report like this with the goods,
which shows the chemical composition and physical properties
100% quality inspection, quality assurance.
Professional titanium manufacturing experience.
Because we only make titanium, we are more professional in titanium
ISO9001:2015 certification
Friendly customer service and short delivery time.
Titanium sputtering targets are mainly used in the electronic and information industries such as integrated circuits, information storage, liquid crystal displays, laser memory and electronic control devices. They can also be used in the field of glass coating. It can also be used in wear resistant materials, high temperature corrosion resistant, premium decorative products and other industries.
High-purity, high-density titanium sputtering target:
Titanium sputtering target (purity: 99.9% -99.999%)
Magnetron sputtering coating is a new type of physical deposition method. There are many obvious advantages over vapor deposition coating methods. As a relatively mature technology developed, magnetron sputtering has been applied in many fields. Titanium sputtering target
Sputtering Technology Titanium Sputtering Target
Sputtering is one of the leading technologies for manufacturing thin film materials. The ions generated by the ion source are used to accelerate and aggregate in vacuum to form a fast energy ion beam, impacting the solid surface and exchanging kinetic energy between the ions and the solid surface atoms. Atoms on the surface of a solid leave the solid and deposit on the surface of the substrate. The impacted solid is a raw material for preparing thin films deposited by the sputtering method, called sputtering targets. Various types of sputtered thin film materials are widely used in semiconductor integrated circuits, photovoltaics, recording media, flat panel displays, and workpiece surface coatings.
Processing of various coating targets:
Metal targets: tungsten target, molybdenum target, tantalum target, niobium target, zirconium target, cobalt target, vanadium target, copper target, platinum target, hafnium target, niobium target, aluminum target, iron target, chromium target, titanium-niobium alloy target , titanium-zirconium alloy target, titanium-tungsten alloy target, titanium-gui alloy target, titanium-aluminum target, nickel-chromium alloy target, aluminum-chromium alloy target, high-purity titanium target, ultra-high-purity titanium target, high-purity nickel target, high-purity tantalum target, polysilicon Target material, ultra-high purity aluminum target, (99.95%-99.999%),
Classification: Multi-arc ion coating target, titanium flat target, titanium rotary tube target, titanium target back plate, titanium target back tube
Uses: tool coating, decorative coating, electronics industry, flat panel display industry, large area Low-E glass coating, semiconductor, LCD, solar energy industry, optical lens, optoelectronic industry, ceramic binding target, spraying target, etc.
